The point-of-use photochemical filters with superior contaminant retention and low hold-up volume performance in sub-10 to 180 nm technology nodes. Both Optimizer® D300 and D600 filters are geared to small-volume filtration of photoresists, resist dielectrics, and solvents. It requires no pre-wetting, so the filters function immediately after installation. Without the need for prewetting, they reduce the likelihood that microbubbles will form and avoid the problems associated with incomplete wetting and the mixing of incompatible chemicals.
- Suitable for semiconductor industry, photolithography, chemical manufacturing and DI water
Membrane: hydrophobic UPE; Supports, housing: HDPE
Maximum operating temperature: 60 °C
Maximum forward/reverse differential pressure: 2,4 bar, 35 psid at 25 °C
Maximum operating pressure: 3,4 bar, 50 psid at 25 °C